The Trend AIR STEALTH Half Mask features a low-profile ergonomic design that minimizes breathing r...The Trend AIR STEALTH Half Mask features a low-profile ergonomic design that minimizes breathing resistance. It is manufactured from high-grade, odour-free, non-allergenic materials. This mask protects the user against airborne particles, oil aerosols, mist, welds, and fumes. The twin HEPAC pleat encapsulated filter design offers 99.99% filtration of airborne particles and aerosols at 0.3 micron and above. The TPE mask body is latex and silicone-free. An exhalation valve located at the bottom of the mask prevents exhalation fumes from steaming up or fogging glasses/visors. A protective grill covers the entire filter surface, safeguarding it from moisture and particulates to enhance performance in clogging pressure and filtration efficiency. A single-piece head and neck strap with a quick-release mechanism ensures added user comfort. The mask conforms to the half mask standard BS EN 140 and provides respiratory protection to BS EN143 P3R, with an approval of P3 (R) APF20 x WEL.
The Trend AIR STEALTH Half Mask features a low-profile ergonomic design that minimizes breathing resistance. It is manufactured from high-grade, odour-free, non-allergenic materials. This mask protects the user against airborne particles, oil aerosols, mist, welds, and fumes. The twin HEPAC pleat encapsulated filter design offers 99.99% filtration of airborne particles and aerosols at 0.3 micron and above. The TPE mask body is latex and silicone-free. An exhalation valve located at the bottom of the mask prevents exhalation fumes from steaming up or fogging glasses/visors. A protective grill covers the entire filter surface, safeguarding it from moisture and particulates to enhance performance in clogging pressure and filtration efficiency. A single-piece head and neck strap with a quick-release mechanism ensures added user comfort. The mask conforms to the half mask standard BS EN 140 and provides respiratory protection to BS EN143 P3R, with an approval of P3 (R) APF20 x WEL.